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News About Anvik's Upcoming Trade Exhibitions, Recent Press Releases, New Technical Articles, and Recently Announced Products and Services
| Apr. '09 | U.S. Patent Office reconfirms key Anvik patent on large-area lithography technology in response to reexamination filing by Nikon |
| Feb. '09 | Anvik president Kanti Jain elected to the National Academy of Engineering |
| Dec. '08 | ABC News Good Morning America features Anvik's patent infringement lawsuits against Nikon, Samsung, LG.Philips and other manufacturers |
| Nov. '08 | Anvik introduces low-cost stepper for lithography and photoablation R&D |
| Jun. '08 | Anvik Corporation awarded its 60th patent |
| Apr. '08 | Anvik files patent infringement lawsuits against flat-panel display and television manufacturers Toshiba, Matsushita, Hitachi, and IPS Alpha |
| Mar. '08 | Anvik president Kanti Jain awarded David Richardson Medal of Optical Society of America |
| Sep. '07 | Collaborative research between Univ. of Illinois and Anvik on ITO patterning for flat-panel displays featured in Photonics Spectra |
| Sep. '07 | Anvik paper on laser projection imaging systems for high-performance circuit boards published in CircuiTree |
| Aug. '07 | Anvik installs large-area lithography system at major U.S. university microelectronics research center |
| Aug. '07 | Anvik Corporation and collaborators win $6.3 million DARPA award for proposal on disruptive manufacturing technology |
| Jun. '07 | Collaborative paper between Univ. of Illinois and Anvik on ITO patterning for flat-panel displays published in Appl. Phys. Letters |
| Jun. '07 | Collaborative paper between Amkor and Anvik on IC substrate circuit formation by laser ablation published in CircuiTree |
| Feb. '07 | Anvik installs high-resolution lithography system at major U.S. defense contractor facility |
| Feb. '07 | Anvik files patent infringement lawsuits against Samsung, Sharp, LG.Philips, CMO, AUO, CPT, and other flat-panel display and television manufacturers |
| Nov. '06 | Anvik installs HexScan 4050 SXE patterning system at major microelectronics manufacturer |
| Nov. '06 | Collaborative paper between Univ. of Illinois and Anvik on flexible microplasma arrays published in Japanese Journal of Appl. Physics |
| Feb. '06 | Anvik president Kanti Jain elected Fellow of IEEE |
| Jan. '06 | University of Illinois at Urbana-Champaign appoints Anvik president Kanti Jain Professor of Electrical and Computer Engineering |
| Oct. '05 | Anvik files patent infringement lawsuit against Nikon |
| Sep. '05 | Anvik paper on laser projection imaging systems for wafer-level packaging published in Solid State Technology |
| Jul. '05 | Invited paper by Anvik on lithography for flexible electronics and displays published in Proceedings of IEEE |
| Mar. '05 | Anvik Corporation awarded its 50th patent |
April 8, 2009
U.S. Patent Office reconfirms key Anvik patent on large-area lithography technology in response to reexamination filing by Nikon
Washington, DC -- The United State Patents and Trademarks Office (USPTO) has issued a "Notice of Intent to Issue a Reexamination Certification" for Anvik Corporation's U.S. Patent 4,924,257 in response to a reexamination request filed by Nikon Corporation. The Reexamination Certification by the USPTO reconfirms the validity of all claims that were challenged by Nikon and the Anvik patent retains all of its claims as originally issued on May 8, 1990. This key patent is one of five Anvik patents on large-area lithography systems and methods that are the subject of patent infringement lawsuits filed by Anvik Corporation against Nikon, Samsung, LG.Philips and several other manufacturers of flat-panel televisions, computer monitors and displays. The lawsuits by Anvik were filed in 2005, 2007 and 2008 (see www.anvik.com/news.html#lawsuit-nikon, www.anvik.com/news.html#lawsuit-samsung-etal, and www.anvi.com/news.html#lawsuit-ips-etal). The reexamination request was filed by Nikon in 2007 during the course of these ongoing lawsuits -- 17 years after the issuance of Anvik patent 2,924,257. The Notice of Intent to Issue a Reexamination Certification confirming Anvik's claims was issued by USPTO on April 8, 2009.
Click here for a pdf copy of the USPTO decision.
February 2009
Anvik president Kanti Jain elected to the National Academy of Engineering
Washington, DC -- Dr. Kanti Jain, president of Anvik Corporation and professor of Electrical and Computer Engineering at the University of Illinois at Urbana-Champaign, has been elected to the National Academy of Engineering (NAE). Election to the NAE is among the highest professional distinctions in engineering. NAE was established in 1964 under a charter from the National Academy of Sciences as a parallel organization of outstanding engineers.
Dr. Jain is specifically honored "For contributions to the development of high-resolution, deep-ultraviolet excimer lithography for microelectronic fabrication." Excimer laser lithography systems are now used worldwide for semiconductor integrated circuit manufacturing. Dr. Ilesanmi Adesida, dean of the College of Engineering at the University of Illinois at Urbana-Champaign, explained, "Professor Kanti Jain's contributions are fundamental to how semiconductor devices and chips are manufactured today. His work has broad impact on computers, cell phones, and many modern day tools and conveniences. It is fitting that he is being elected into the Academy for his achievements." In addition, at Anvik Corporation, Dr. Jain and his team developed the technologies for large-area lithography that are widely used today in the production of flat-panel displays and televisions.
December 1, 2008
ABC News Good Morning America features Anvik's patent infringement lawsuits against Nikon, Samsung, LG.Philips and other manufacturers
New York, NY -- The Good Morning America television program of ABC News ran a story on Anvik Corporation's ongoing lawsuits against Nikon, Samsung, LG.Philips and other manufacturers of flat-panel televisions, computer monitors and displays. (see www.anvik.com/news.html#lawsuit-nikon, www.anvik.com/news.html#lawsuit-samsung-etal, and www.anvi.com/news.html#lawsuit-ips-etal). The lawsuits against these defendants were filed by Anvik for infringement of five of its key patents that cover large-area microlithography systems and methods used in the manufacturing of the vast majority of such flat-screen products sold worldwide.
Full story: abcnews.go.com/GMA
November 2008
Anvik introduces low-cost mini-stepper for lithography and photoablation R&D and prototyping
Hawthorne, New York
Anvik Corporation has introduced the NexStep 1020 SXE microlithography and photoablation system, a revolutionary advance in multifunction laser processing systems. It is a low-cost step-and repeat tool designed for R&D and prototyping. It offers the unique combination of high-resolution projection lithography in photoresists, photoablation in polymers, and high-fluence materials processing of semiconductors and other materials, making it the ideal patterning tool for prototyping and pilot production as well as exploration of new frontiers in micro-optics, optoelectronics, MEMS, microfluidics, and biophotonics in a multi-user, multidisciplinary environment.
For further information, see: NexStep 1020 SXE Brochure or send inquiy to: info@anvik.com
June 24, 2008
Anvik Corporation awarded its 60th patent
HIGH-BRIGHTNESS, COMPACT ILLUMINATOR WITH INTEGRATED OPTICAL ELEMENTS
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Hawthorne, NY -- Anvik Corporation has been awarded its 60th patent. Issued on June 24, 2008 to inventor Kanti Jain, U.S. Pat. 7,390,116 describes advances made by Anvik in light sources and illumination systems for optical projection, and specifically relates to such applications in which it is important to maximize the light collection from a source lamp, to minimize the size and power requirement of the lamp, to make the spatial uniformity of the lamp's light beam high, and to collect the light within a specified numerical aperture so as to optimize the imaging performance of the projection system. An attractive application of the invention is in electronic digital projectors. This patent further strengthens Anvik's intellectual property portfolio in optical imaging and microelectronics manufacturing technologies, which now includes 68 patents, of which 61 have been issued or allowed and 7 are pending. Anvik's business in microelectronics manufacturing systems is based on its diverse patent portfolio that comprises major innovations in optical system designs, microlithography processes and tools, opto-mechanical devices, energy-efficiency technologies, and laser materials processing systems.
See: Patent Portfolio
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April 29, 2008
Anvik files patent infringement lawsuits against flat-panel display and television manufacturers Toshiba, Matsushita, Hitachi, and IPS Alpha
Hawthorne, New York
Anvik Corporation has filed complaints against several additional major manufacturers of flat-panel displays and televisions in Japan and their U.S. subsidiaries, including Toshiba Corporation, Matsushita Electric Industrial Co., Ltd., Hitachi, Ltd., and IPS Alpha Technology, Ltd., for infringement of five Anvik patents that cover inventions in high-performance microlithography systems. Such systems are critical tools for manufacturing of microelectronics products, including flat-panel displays, televisions, semiconductor integrated circuits, and microelectronic packaging devices. The complaints were filed April 29, 2008 in the U.S. District Court for the Southern District of New York, White Plains Division.
The present lawsuits follow the complaints Anvik filed on February 2, 2007 against Samsung Electronics Co. Ltd. (Korea), Sharp Corporation (Japan), LG.Philips LCD Co., Ltd. (Korea), Chi Mei Optoelectronics (Taiwan), AU Optronics Corporation (Taiwan), Chunghwa Picture Tubes, Ltd. (Taiwan), Tatung Company (Taiwan), Toppan Printing Co., Ltd. (Japan), HannStar Display Corporation (Taiwan), Innolux Display Corporation (Taiwan), and AFPD PTE Ltd. (Singapore).
The inventions described and claimed in the patents are incorporated in Anvik's own microlithography systems that enable cost-effective, high-volume manufacture of a wide array of microelectronic and display products.
Anvik, based in Hawthorne, New York, is a producer of advanced microlithography and photoablation systems for high-throughput manufacturing of microelectronic devices, flat-panel displays, and flexible electronics. Anvik has advanced the state of the art of microlithography and materials processing systems for microelectronics manufacturing, and has made and installed such equipment in the U.S. and abroad.
In these lawsuits, Anvik is represented by the law firms of Bernstein Litowitz Berger & Grossman, LLP and Cozen O'Connor.
For further information, send inquiy to: info@anvik.com
March 2008
Anvik president Kanti Jain awarded David Richardson Medal of Optical Society of America
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Washington, DC -- Dr. Kanti Jain, president of Anvik Corporation, has been awarded the David Richardson Medal by the Board of Directors of the Optical Society of America for achievements in the field of optical engineering. Each year OSA presents the award to one individual chosen for his "dedication, ingenuity, and perseverance in attaining the highest level of scientific achievement in their chosen fields." The award recognizes those who have had significant influence primarily in the commercial and industrial sector of optical engineering. Dr. Jain is specifically honored for his "pioneering contributions to the development of high-resolution optical microlithography technologies, especially for the invention and development of excimer laser lithography technologies and systems for production of microelectronic devices," according to the OSA citation. Excimer laser lithography systems are now used worldwide for semiconductor integrated circuit manufacturing. In addition, at Anvik, Dr. Jain and his team developed the technologies for large-area lithography that are widely used today in the production of flat-panel displays and televisions.
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Photonics Spectra, Vol. 41, No. 9, p. 112, September 2007
Collaborative research between University of Illinois and Anvik on ITO patterning for flat-panel display fabrication featured in Photonics Spectra
PATTERNING FILMS WITH FEWER STEPS
By Hank Hogan
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Urbana, Illinois -- A team of researchers from the University of Illinois at Urbana-Champaign and from Anvik Corp. of Hawthorne, N.Y., has demonstrated a fabrication technique that inscribes patterns onto thin films of indium tin oxide in fewer steps than are typically used in traditional lithography. The group used laser-driven photoablation and subsequent lift-off of an underlying photoresist layer to pattern the material, a transparent conductive oxide used in flat panel displays. Because the new approach has fewer steps, it is potentially faster and cheaper.
Click here for a pdf copy of the full article.
See also: www.photonics.com
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CircuiTree, Vol. 20, No. 9, p. 44, September 2007
Anvik paper on laser projection imaging systems for high-performance circuit boards published in CircuiTree
EXCIMER LASER PROJECTION IMAGING FOR HIGH-PERFORMANCE CIRCUIT BOARD PATTERNING
L. Wojcik et al.
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Abstract: A new class of laser projection imaging (LPI) systems has been developed that represents a breakthrough in cost-effective production of high-performance, high-volume printed circuit boards and other microelectronic systems fabricated on large substrates. The new LPI systems provide not only very high resolution and precise alignment, but also high throughput with conventional, widely used, dry-film and liquid photoresists, eliminating the shortcomings of contact, laser direct imaging (LDI), and other exposure tools.
Click here for a pdf copy of this paper.
See also: www.circuitree.com
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August 2007
Anvik installs large-area lithography system at major U.S. university microelectronics research center
ANVIK HEXSCANTM 2020 SXE LARGE-AREA LITHOGRAPHY SYSTEM FOR DIVERSE MICROELECTRONIC, OPTOELECTRONIC, AND BIOENGINEERING APPLICATIONS
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Hawthorne, New York -- Anvik Corporation has installed a large-area lithography system, the HexScanTM 2020 SXE from its family of Laser Projection Imaging (LPI) systems, at a major U.S. univeristy's micro and nanotechnology research center. The Anvik system, capable of providing 2 micron resolution seamlessly over 500 x 500 mm substrates with automatic high-precision alignment, is attractive for fabrication of a wide variety of microelectronic, optoelectronic, microfluidic, and biophotonic devices. The HexScanTM 2020 SXE system represents a unique advance in projection lithography systems: in addition to delivering high-resolution seamless imaging on large areas with high-precision alignment, it is also capable of excimer laser photoablation patterning in polymers and other materials. The revolutionary dual-function capability of large-area lithography and photoablation is expected to be of significant impact in numerous scientific, commercial, and military applications.
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August 2007
Anvik Corporation and collaborators win $6.3 million DARPA award for proposal on disruptive manufacturing technology
DIRECT DIGITAL MANUFACTURING OF AIRFOILS
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Hawthorne, New York -- A team comprising University of Michigan at Ann Arbor, Anvik Corporation, University of Illinois at Urbana-Champaign, and Honeywell Aerospace has received a $6.3M, four-year award from DARPA for their proposal "Direct Digital Manufacturing (DDM) of Airfoils" in response to DARPA's solicitation on "Disruptive Manufacturing Technologies." Airfoils are critical components in high-performance engines for airplanes, tanks and other defense systems. DDM of airfoils will be achieved by the processing of photocurable ceramic resins through a novel direct digital manufacturing technology known as Large Area Maskless Photopolymerization (LAMP) being developed by the team. LAMP combines layered manufacturing of complex three-dimensional objects by solid freeform fabrication (SFF) with the fine-feature resolution and high throughput of massively parallel scanning maskless lithography to achieve a disruptive breakthrough in part build speed and feature definition. In addition to components for defense systems, the new technology will also be attractive for manufacturing of complex gears, motor components and objects in electronic and medical systems currently made by conventional molding processes.
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Applied Physics Letters, Vol. 90, No. 26, p. 261102, June 25, 2007
Collaborative paper between University of Illinois and Anvik on ITO patterning for flat-panel display fabrication published in Applied Physics Letters
PATTERNING OF INDIUM TIN OXIDE BY PROJECTION PHOTOABLATION AND LIFT-OFF PROCESS FOR FABRICATION OF FLAT-PANEL DISPLAYS
J. Chae, S. Appasamy and K. Jain
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Abstract: Indium tin oxide (ITO), an important material used as a transparent conductive oxide in thin-film-transistor liquid-crystal display (TFT-LCD) fabrication, was patterned by a non-lithographic process. First, a Si3N4 substrate coated with photoresist was patterned by a projection photoablation process using 248 nm wavelength KrF excimer laser radiation. ITO was then deposited by sputtering and patterned by lift-off. The resulting ITO pattern was clean even though it was patterned without the conventional steps of photoresist development and ITO etching. This process technology provides a faster and more economical patterning capability compared to conventional photolithography and etch processes used in the display industry.
Click here for a pdf copy of this paper.
See also: apl.aip.org
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CircuiTree, Vol. 20, No. 6, p. 12, June 2007
Collaborative paper between Amkor and Anvik on IC substrate circuit formation by laser projection ablation published in CircuiTree
UNVEILING THE NEXT GENERATION IN INTEGRATED CIRCUIT SUBSTRATE CIRCUIT FORMATION
R. Huemoeller et al.
Abstract: The electronic packaging industry has been crippled by the incremental technology advances produced by substrate manufacturers in recent years. While semiconductors technologies continue to progress rapidly, the substrate portion of the IC packaging industry continues to fall further behind. This has created a significant technology gap, forcing the semiconductor manufacturers to compensate their chip design by adding more redistribution layers or even worse, increasing the chip size. Thus, the IC industry is in dire need of a significant change at the substrate level to remove the innovation barriers that exist today and allow chip designers to continue reducing the chip size and cost, while increasing the functionality.
A collaborative effort between Amkor Technology, Unimicron, Anvik and Atotech has led to a significant new breakthrough in substrate manufacturing techniques, allowing both layer and format reduction (therefore, cost reduction). The tremendous growth and need for a disruptive technology in IC substrates has helped to facilitate the implementation of this new method that allows the miniaturization of both IC design features and substrate format. The new technology utilizes laser photoablation techniques, together with specially developed plating processes, to form electrical paths for signal propagation within the dielectric, as opposed to conventional technologies that form signal paths above the dielectric.
This technology provides opportunity for significant gap closure to current needs in the chip packaging industry. The laser structured approach offers a unique opportunity to simultaneously improve upon traditionally incremental advances in design as well as optimize electrical performance by reducing signal paths. Ultimately, this approach addresses critical needs for the coming generations of chip packaged substrates by not only driving miniaturization in design, but also by improving the electrical performance of the package. This paper unveils the technology and benefits that the laser embedded approach provides.
Click here for a pdf copy of this paper.
See also: www.circuitree.com
February 2007
Anvik installs high-resolution lithography system at major U.S. defense contractor facility
ANVIK HEXSCANTM 3010 CXM HIGH-RESOLUTION LITHOGRAPHY SYSTEM FOR MICROELECTRONIC, OPTOELECTRONIC, AND BIOPHOTONIC APPLICATIONS
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Hawthorne, New York -- Anvik Corporation has installed a high-resolution lithography system, the HexScanTM 3010 CXM from its family of Laser Projection Imaging (LPI) systems, at a major U.S. defense contractor's facility. The Anvik system, capable of providing better than 1 micron resolution seamlessly over 200 x 200 mm substrates with automatic submicron-precision alignment, is attractive for fabrication of a wide variety of microelectronic, optoelectronic, microfluidic, and biophotonic devices. The HexScanTM 3010 CXM system represents a unique advance in projection lithography systems: in addition to delivering high-resolution seamless imaging on large areas with high-precision alignment, it is also upgradable to provide micron-level conformable patterning on curved surfaces. The revolutionary capability of conformable lithography is expected to be of significant impact in numerous scientific, commercial, and military applications.
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February 2, 2007
Anvik files patent infringement lawsuits against Samsung, Sharp, LG.Philips, CMO, AUO, CPT, Toppan, and other flat-panel display and television manufacturers
Hawthorne, New York
Anvik Corporation has filed complaints against several major manufacturers of flat-panel displays and televisions and their U.S. subsidiaries, including Samsung Electronics Co. Ltd. (Korea), Sharp Corporation (Japan), LG.Philips LCD Co., Ltd. (Korea), Chi Mei Optoelectronics (Taiwan), AU Optronics Corporation (Taiwan), Chunghwa Picture Tubes, Ltd. (Taiwan), Tatung Company (Taiwan), Toppan Printing Co., Ltd. (Japan), HannStar Display Corporation (Taiwan), Innolux Display Corporation (Taiwan), and AFPD PTE Ltd. (Singapore), for infringement of five Anvik patents that cover inventions in high-performance microlithography systems. Such systems are critical tools for manufacturing of microelectronics products, including flat-panel displays, televisions, semiconductor integrated circuits, and microelectronic packaging devices. The complaints were filed February 2, 2007 in the U.S. District Court for the Southern District of New York, White Plains Division.
The inventions described and claimed in the patents are incorporated in Anvik's own microlithography systems that enable cost-effective, high-volume manufacture of a wide array of microelectronic and display products.
Anvik, based in Hawthorne, New York, is a producer of advanced microlithography and photoablation systems for high-throughput manufacturing of microelectronic devices, flat-panel displays, and flexible electronics. Anvik has advanced the state of the art of microlithography and materials processing systems for microelectronics manufacturing, and has made and installed such equipment in the U.S. and abroad.
In these lawsuits, Anvik is represented by the law firms of Bernstein Litowitz Berger & Grossman, LLP and Cozen O'Connor.
For further information, send inquiy to: info@anvik.com
Novemeber 2006
Anvik installs production system at major microelectronics manufacturer
ANVIK HEXSCANTM 4050 SXE HIGH-SPEED PATTERNING AND PHOTOABLATION SYSTEM FOR VOLUME PRODUCTION OF MICROELECTRONIC PACKAGES
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Hawthorne, New York
Anvik Corporation has installed a high-speed patterning and photoablation system, the HexScanTM 4050 SXE from its family of Laser Projection Imaging (LPI) systems, at an undisclosed, major microelectronics manufacturer's facility. The Anvik system, for use in high-volume production of advanced microelectronic packages, is capable of delivering better than 10-micron resolution seamlessly over large panels, provides automatic alignment and scale compensation, and is capable of automatic panel loading and unloading.
The Anvik system represents a revolutionary advance in large-area photoablation systems: it offers the unique combination of high-resolution projection imaging, high-precision alignment, and high throughput -- eliminating the limitations of other via drilling and laser structuring equipment. The HexScanTM system is particularly attractive for cost-effective, volume production of high-density electronic packages.
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Japanese J. of Applied Physics, Vol. 45, No. 10B, p. 8221, 2006
Collaborative paper between University of Illinois and Anvik on flexible microplasma arrays published in Japanese Journal of Applied Physics
FLEXIBLE ARRAYS OF NI/POLYIMIDE/CU MICROPLASMA DEVICES WITH A DIELECTRIC BARRIER AND EXCIMER LASER ABLATED MICROCAVITIES
S.-J. Park et al.
Abstract: Microcavity plasma devices with circular, crescent or, for example, trapezoidal cross-section microcavities (characteristic dimension d=30-100 µm), produced by excimer laser ablation and overcoated with a silicon nitride barrier film, have been fabricated in Ni/30 micron polyimide/3 micron Cu layered substrates. 12_12 arrays of devices with cylindrical microcavities 100 micron in diameter exhibit turn-on voltages of 255-270 Vrms for a Ne pressure of 700 Torr and a sinusoidal excitation voltage having a frequency of 5-20 kHz. All of the device designs explored to date operate in the abnormal glow region, and an increase of 15-20% in the ignition voltage for these arrays is observed when pd is raised from 4 to 5 Torr cm. Tests in which the arrays were intentionally damaged or photoablation parameters were altered from the optimal values show the microplasma devices to be extraordinarily robust and insensitive to the cross-sectional shape of the microcavity.
Click here for a pdf copy of this paper.
February 2006
Anvik president Kanti Jain elected Fellow of IEEE
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Washington, DC -- Dr. Kanti Jain, president of Anvik Corporation, has been conferred the title of IEEE Fellow by the Board of Directors of the Institute of Electrical and Electronics Engineers for his work on high-resolution excimer laser lithography. As presented in an IEEE press release: "An important part of the IEEE's mission is to recognize the professional achievements of its members. The Institute's highest honor is the rank of IEEE Fellow, bestowed on members who have contributed 'to the advancement or application of engineering science and technology'." The technology of excimer laser lithography was invented and developed by Dr. Jain at IBM in the 1980's and is now used worldwide in semiconductor chip production.
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January 2006
University of Illinois at Urbana-Champaign appoints Anvik president Kanti Jain Professor of Electrical and Computer Engineering
Urbana, IL -- Dr. Kanti Jain, president of Anvik Corporation, has been appointed Professor of Electrical and Computer Engineering at the University of Illinois at Urbana-Champaign. At Illinois, his objective is to initiate a number of new research programs that will advance the state-of-the-art in microelectronic, optoelectronic, microsystem and biophotonic devices by developing and exploiting novel micro/nano-fabrication technologies. These fabrication technologies will enable patterning and microstructuring of a variety of organic and inorganic materials -- including new polymers, semiconductors, metals, dielectrics and biological materials -- and producing structures, devices and systems previously not deemed possible. Dr. Jain will continue in his responsibility as president of Anvik Corporation.
See also: www.ece.uiuc.edu/faculty and Photonics, Microelectronics, and Microsystems Laboratory
October 5, 2005
Anvik files patent infringement lawsuit against Nikon
Hawthorne, New York
Anvik Corporation has filed a complaint against Nikon Corporation and two of its U.S. subsidiaries for infringement of six Anvik patents that cover inventions in high-performance microlithography systems. Such systems are critical tools for manufacturing of microelectronics products, including semiconductor integrated circuits, microelectronic packaging devices, and flat-panel displays. The complaint was filed September 8, 2005 in the U.S. District Court for the Southern District of New York, White Plains Division. Named defendants are Nikon Precision, Inc., Nikon Research Corporation of America, and Nikon Corporation.
The inventions described and claimed in the patents are incorporated in Anvik's own microlithography systems that enable cost-effective, high-volume manufacture of a wide array of microelectronic and display products.
Anvik, based in Hawthorne, New York, is a producer of advanced microlithography and photoablation systems for high-throughput manufacturing of microelectronic devices, flat-panel displays, and flexible electronics. Anvik has advanced the state of the art of microlithography and materials processing systems for microelectronics manufacturing, and has made and installed such equipment in the U.S. and abroad.
In these lawsuits, Anvik is represented by the law firms of Bernstein Litowitz Berger & Grossman, LLP and Cozen O'Connor.
For further information, send inquiry to: info@anvik.com
Solid State Technology, Vol. 48, No. 9, p.30, September 2005
Anvik paper on Laser Projection Imaging Systems for Wafer-Level Packaging published in Solid State Technology
HIGHER THROUGHPUT AND YIELDS FROM LASER SCANNING PROJECTION IN WLP
M. Klosner et al.
Abstract: To meet the patterning needs of wafer-level packaging (WLP), the IC industry has relied on familiar contact printers and stepper systems. There is, however, a new technology that promises to meet all of the lithography requirements for WLP. This technology employs 1X projection scanning, and uses a high-power 351nm xenon fluoride (XeF) laser and a single stage capable of seamless high-speed scans to print 300mm wafers with high throughput in wafer-bumping applications.
See also: sst.pennnet.com
Proc. IEEE, Vol. 93, No. 8, p. 1500, August 2005
Invited paper by Anvik on lithography for flexible electronics and displays published in Proceedings of IEEE
FLEXIBLE ELECTRONICS AND DISPLAYS: HIGH-RESOLUTION, ROLL-TO-ROLL, PROJECTION LITHOGRAPHY AND PHOTOABLATION PROCESSING TECHNOLOGIES FOR HIGH-THROUGHPUT PRODUCTION
K. Jain, M. Klosner, M. Zemel, and S. Raghunandan
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Abstract: Flexible electronics are increasingly being used in a number of applications which benefit from their low profile, light weight, and favorable dielectric properties. However, despite these advantages, the range of practical, high-volume applications for flexible electronics will remain limited in the future unless a number of challenges related to lithographic patterning on flexible substrates are successfully addressed. The most critical of these pertain to system parameters that affect the cost and performance of flexible circuits, including the resolution, panel size, process throughput, substrate distortion, material handling, and yield. We present a new class of roll-to-roll lithography systems, developed in recent years, that were designed to address the challenges in each of these critical areas. These systems provide high-resolution projection imaging over very large exposure areas, on flexible substrate materials. Additionally, they achieve high-precision alignment by means of image scaling to compensate for substrate distortion due to processing; and they also perform high-throughput photoablation, patterning millions of pixels simultaneously, by means of projection imaging. This technology is attractive for current and emerging applications, such as flexible circuit boards and flexible chip carriers, as well as for potential future applications such as flexible displays and macroelectronic systems.
Click here for a pdf copy of the full paper.
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March 22, 2005
Anvik Corporation awarded its 50th patent
MASKLESS LITHOGRAPHY WITH MULTIPLEXED SPATIAL LIGHT MODULATORS
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Hawthorne, NY -- Anvik Corporation has been awarded its 50th patent. Issued on March 22, 2005 to inventor Kanti Jain, U.S. Pat. 6,870,554 describes recent advances made by Anvik in maskless lithography technology, especially directed toward high-throughput fabrication of sub-100 nm microelectronic devices. This patent further strengthens Anvik's intellectual property portfolio in micro- and nanolithography technology, which now includes 40 patents, of which 7 are in maskless lithography. Anvik's business in microelectronics manufacturing systems is based on a diverse patent portfolio that comprises major innovations in optical system designs, microlithography processes and tools, opto-mechanical devices, energy-efficiency technologies, and laser materials processing systems.
See: Patent Portfolio
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